Specialists in Environmental Monitoring
Manufacturing
Semiconductors
Ozone applications in semiconductor manufacturing include:
- Surface cleaning
- Photoresist stripping
- Metal and particle removal
- Disinfection
The economic advantages of this technology are savings of chemicals and DI water.
Ozone technology in silicon wet cleaning processes can replace the conventional RCA methods. The application of ozonated DI water (DI-O3 water) can be used in silicon wafer surface preparation, including removal of organic impurities, metallic contaminants and particles as well as photoresist stripping.
Recommended Aeroqual Ozone Monitors for this application
- Portable & fixed monitors available
- Global distribution for application-specific solutions
- Multi-technology integrated solutions
- Monitoring of gases, particles, noise, & more
- When issue is identified, mitigation strategies can be adopted
- Establish pollution pattern & remove causes
- Avoid poor air quality conditions
- Ongoing measurement to monitor mitigation programs
